The conference gives an overview of the present status in mask and lithography technologies and their future strategies. It provides a place where mask makers, mask users and their tool suppliers find the opportunity of becoming acquainted with new development and results. The conference also gives experts the opportunity to meet with leading experts in fields of common interest. <b>Keywords:</b> Mask Manufacturing:<br>– Pattern Generation and Data Preparation<br>– Photomask– Processes and Materials<br>– Mask Process Yield<br>– PS–Mask and Masks for OPC<br>– Mask for NGL: E–Beam, EUV, NIL ….<br>– Metrology<br>– Defect Inspection and Repair<br>– Cleaning and Pelliclization<br>Other Mask Topics:<br>– Mask Cost and Mask CoO<br>– Future Mask Demand<br>– Mask Business Considerations<br>Lithography and Mask Applications<br>– Resolution Enhancement Techniques<br>– MEEF<br>– Mask Defect Printability<br>– Immersion Lithography<br>– New Lithography Technologies: 157nm, NGL<br>(EUV; EPL; LEEPL; X–Ray and Nano– Imprint).<br>– Maskless Lithography techniques<br>Mask and Lithography Equipment
Abbrevation
EMLC
City
Dresden
Country
Germany
Deadline Paper
Start Date
End Date
Abstract