SPIE′s Microlithography Symposium is an annual international forum bringing practitioners of micro– and nano–lithography together in an exciting, informative, and interactive environment. The Symposium is strongly committed to supporting your interests whether you work in semiconductor production fabs, development facilities, or research laboratories. It succeeds because the programs are tailored to people like you: those using technologies for today′s production or developing them for production in the near future. Moreover, the numerous short courses offered at Microlithography 2006 are taught by people active in the field, recognized for both theoretical knowledge and practical experience.<br>Hear the latest about state–of–the–art applications and techniques, as well as emerging issues as you are presented with new challenges and alternative technologies. This variety in topic becomes all the more important as optical lithography, historically the dominant patterning technology, faces new challenges in providing the patterning solutions for leading edge semiconductor manufacturing. <b>Keywords:</b> Emerging Lithographic Technologies<br>Metrology, Inspection, and Process Control for Microlithography<br>Advances in Resist Materials and Processing Technology<br>Optical Microlithography<br>Data Analysis and Modeling for Patterning Control<br>Design and Process Integration for Microelectronic Manufacturing<br>
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ML
City
San Jose
Country
United States
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