The Annual BACUS Symposium is the premier worldwide technical conference for the photomask industry. As a Technical Group of SPIE, BACUS members meet yearround to focus on issues that are key to the industry. This year’s four–day symposium will give the authors a chance to present their research on emerging and on–going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. <b>Keywords:</b> Mask Infrastructure<br>• Materials<br>• Patterning<br>• Resist Processing<br>• Etch<br>• Inspection<br>• Cleaning<br>• Repair<br>• Metrology<br>Mask Integration<br>• Design for Manufacturing/Process Integration<br>• Simulation and Tolerancing for Hyper–NA Applications<br>• Substrate and Materials<br>• Extreme NA/Immersion Applications<br>• Reticle Enhancement and Optical Proximity Effects<br>• Mask Data Preparation and Mask Rules Development<br>• Advanced RET<br>• DFM Opportunities for Fabless Applications<br>Emerging Mask Technology<br>• EUV Mask Materials<br>• EUV Mask Infrastructure<br>• Imprint<br>• Gray Scale Technology<br>Mask Business<br>• Mask Business and Management<br>• Direct Write/Maskless Technology<br>
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City
Monterey
Country
United States
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