The three–day conference was dedicated to the science, technology, engineering, and application of mask and lithography technologies and associated processes. It gave an overview of the present status in mask and lithography technologies as well as future strategies for photomask makers. It also provided an opportunity for mask producers and users to become acquainted with new developments and results. The conference focused on the important fields of photomask lithography technologies and manufacturing processes. Beside sessions on Advanced Lithography and Simulation, Metrology, DFM&MDP, Mask Making, Mask Repair and Mask Cleaning, and EUV we organized a session for Nano Imprint Lithography because of the growing interest in this technology. Thursday there were two sessions on Immersion Lithography, both organized with the support of IMEC. <b>Keywords:</b> Mask Manufacturing<br>Mask Manufacturing:<br>Pattern Generation and Data Preparation<br>Photomask Processes and Materials<br>Mask Process Yield<br>PS–Mask and Masks for OPC<br>Mask for NGL: E–Beam, EUV, NIL…..<br>Metrology<br>Defect Inspection and Repair<br>Cleaning and Pelliclization<br>Other Mask Topics<br>Mask Cost and Mask CoO<br>Future Mask Demand<br>Mask Business Considerations<br>Lithography and Mask Applications<br>Resolution Enhancement Techniques<br>MEEF<br>Resist<br>Mask Defect Printability<br>Optical Materials<br>Immersion Lithography<br>Immersion Defectivity<br>Alternate Immersion Fluids<br>Emerging Lithography Technologies: 157nm, EUV; X–Ray and Nanoimprint and embossing<br>Double exposure lithography strategies<br>Maskless lithography techniques<br>Mask and Lithography Equipment<br>
Abbrevation
EMLC
City
Grenoble
Country
France
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