The annual SPIE Advanced Lithography (formerly Microlithography) Symposium is a forum that brings together practitioners of the art of lithography into an exciting, informative, and very practical environment. This Symposium has a strong commitment to simultaneously support the interests of people working in semiconductor production lines, pilot lines, and research laboratories. It has been highly successful for the past 30 years because the programs in the five conferences are organized by users: those who are active in using technologies for production today or developing solutions for future production challenges. The numerous short courses are taught by instructors who are active in the field and are recognized for both theoretical knowledge and practical experience. The SPIE Advanced Lithography Symposium is truly encompassing. It covers the state–of–the–art lithographic tools, resists, metrology, materials characterization, and design and process integration. It covers issues to be faced as we extend these technologies or try to switch to alternative technologies. This variety looms more important as optical lithography, historically the dominant patterning technology, becomes more difficult to apply to leading edge IC fabrication. The strength of the SPIE Advanced Lithography Symposium is the emphasis on presenting real data and applications. <b>Keywords:</b> Emerging Lithographic Technologies<br>Metrology, Inspection, and Process Control for Microlithography<br>Advances in Resist Materials and Processing Technology<br>Optical Microlithography<br>Design for Manufacturability through Design–Process Integration<br>
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AL
City
San Jose
Country
United States
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