Photomask Japan 2007, Kanagawa, Japan

Photomask Japan 2007 is the 14th international symposium on photomasks and NGL masks in Japan&#046; The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends&#046; The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion&#046; Display opportunities will be provided to mask manufacturing materials, and equipment companies&#046;<br><b>Keywords:</b> Materials of and for Photomasks<br>Photomask Writing Tools and Technologies<br>Photomask Process and Equipments for Accuracy and Quality<br>Metrology Tools and Technologies<br>Inspection Tools and Technologies<br>Repairing Tools and Technologies<br>Photomasks with RET: PSM, OPCed Masks<br>Photomask relating Lithography Technologies<br>EDA for Photomask<br>Mask Data Preparations<br>Masks for NGL: EUV, E&#8211;Beam, Imprint etc&#046;<br>Mask Cost and Mask Development Strategy<br>