2006 International Microprocesses and Nanotechnology Conference, Kamakura, Japan

Abbrevation

MNC

Link

http://www.imnc.jp/

City

Kamakura

Country

Japan

Deadline Paper

2006-07-05

Start Date

2006-10-25

End Date

2006-10-27

Abstract

Microprocess and nanotechnology play an important role of technical backbone for constructing the advanced information communications society with ubiquitous networks of the 21st century. The MNC conference is now in its 19th year and is intended to provide a forum for discussing lithographic science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro– and nano–structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical, information, and communication technology. Keywords: 1.Lithography and Related Technologies 1–1:DUV, VUV, EUV Lithography This session fouces on DUV, VUV, EUV as well as Liquid Immersion Lithography. In addition, Metrology, Inspection and Repair are included. 1–2:Electron and Ion Beam Lithography Electron and ion beam lithography including exposure system, resist process, data processing and masks, and metrology, inspection, repair and related technologies using electron or ion beam. 1–3:Resist Materials and Processing Resists, thin films, multilayer and inorganic resists, molecular resists, resists for immersion lithography, antireflective coatings, and related materials for lithography, resist processes, characterization, line–edge roughness, modeling of exposure and development 2:Nanotechnology 2–1:Nanodevice Physics, fabrication, characterization and related technologies of nanodevices, such as non–classical CMOS, quantum–effect devices, single–electron devices, nanowire devices and molecular devices. Novel concept devices and systems utilizing nanostructures and nanophysics are also welcome. 2–2:Nanofabrication Fabrication of nanostructures and nanomaterials. Fabrication techniques such as scanning probe techniques, self–organizing techniques, etc. Physics and chemistry in nanofabrication processes. Etching, deposition, and related subsurface processing using photon, electron– and ion–beams, plasma, and thermal energy. Emerging technologies are also welcome. 2–3:Nanomaterials Theory, properties, preparation, characterization and application of Nanomaterials such as quantum dots, nano–particles, nanowires, carbon nanotubes, organic and molecular materials. Self–organization and bottom–up technologies. 3:Nanoimprint, Nanoprint and Rising Lithography Nano imprint, nano print, embossing, novel nano lithographic technology 4:Bio MEMS (Bio Micro Electro Mechanical Systems), Lab on a Chip Micro/nano electromechanical devices (M/NEMS) are now widely applied to biochemical, medical and environmental fields and a new research field called μ–TAS or Lab. on a Chip is expanding. Fusion of microelectronic devices with materials and methods in the biomedical fields is expected to open up new scientific and business areas. Papers are solicited in the following areas (but not limited): (1) MEMS/NEMS devices for biomedical fields, (2) μ–TAS and Lab on a chip, (3) Bio–chips for DNA, proteins and cells, (4) Fabrication technologies. 5:Microsystem Technology and MEMS Fabrication techniques of three dimensional microstructures and their applications to micromechanics, microwave and photonics, vacuum microelectronics, novel sensors and actuators, etc.