The focus of this three–day conference is “state–of–the–art” for the development of mask technologies such as lithography, data processing, RET, OPC, resist, metro–logy, and inspection.<br>This conference has annually brought together scientists, researchers, engineers and developers from around the world to present papers at the forefront of the photomask manufacturing and research. It provides a place where mask makers, mask users and their tool suppliers have the opportunity to become acquainted with new develop–ments and results. <b>Keywords:</b> Mask Manufacturing:<br>– Pattern Generation and Data Preparation – Photomask– Processes and Materials – Mask Process Yield – Photomasks with RET and OPC; PSM – Mask for NGL: E–Beam, EUV; NIL etc. – Metrology Tools and Technologies – Defect Inspection– and Repair Tools – Cleaning and Pelliclization<br>
Abbrevation
EMLC
City
Dresden
Country
Germany
Deadline Paper
Start Date
End Date
Abstract