Abbrevation
ULIS
City
Udine
Country
Italy
Deadline Paper
Start Date
End Date
Abstract

<SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>The aim of the ULIS Conference is to provide an open forum for the presentation and discussion of recent research in technology, physics, modeling, simulation and characterization of advanced nanoscale silicon and silicon compatible devices in the More Moore, More than Moore and Beyond CMOS domains&#046;<BR></SPAN> <B>Keywords:</B> <UL> <LI><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: Symbol&#8243;><SPAN><SPAN style=&#8243;FONT: 7pt &#8242;Times New Roman&#8242;; font&#8211;size&#8211;adjust: none; font&#8211;stretch: normal&#8243;></SPAN></SPAN></SPAN><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>Nanometer scale devices: physics, technology, characterization techniques and evaluation metrics for high performance, low power, low standby power, high frequency and memory applications&#046;<?XML:NAMESPACE PREFIX = O /><O:P></O:P></SPAN> <LI><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: Symbol&#8243;><SPAN><SPAN style=&#8243;FONT: 7pt &#8242;Times New Roman&#8242;; font&#8211;size&#8211;adjust: none; font&#8211;stretch: normal&#8243;></SPAN></SPAN></SPAN><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>CMOS scaling perspectives; device / circuit level performance evaluation; switches and memory scaling&#046;<O:P></O:P></SPAN> <LI><SPAN lang=EN&#8211;GB style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: Symbol&#8243;><SPAN><SPAN style=&#8243;FONT: 7pt &#8242;Times New Roman&#8242;; font&#8211;size&#8211;adjust: none; font&#8211;stretch: normal&#8243;></SPAN></SPAN></SPAN><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>New channel materials for CMOS electronics: strained Si,<SPAN> </SPAN>strained SOI, SiGe,<SPAN> </SPAN>GOI, III&#8211;V and high mobility materials for MOSFET; carbon based electronics; carbon nanotubes; graphene based devices&#046;</SPAN><SPAN lang=EN&#8211;GB style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;><O:P></O:P></SPAN> <LI><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: Symbol&#8243;><SPAN><SPAN style=&#8243;FONT: 7pt &#8242;Times New Roman&#8242;; font&#8211;size&#8211;adjust: none; font&#8211;stretch: normal&#8243;></SPAN></SPAN></SPAN><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>Thin gate dielectrics: first and second generation high&#8211;k materials for switches and memory&#046;<O:P></O:P></SPAN> <LI><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: Symbol&#8243;><SPAN><SPAN style=&#8243;FONT: 7pt &#8242;Times New Roman&#8242;; font&#8211;size&#8211;adjust: none; font&#8211;stretch: normal&#8243;></SPAN></SPAN></SPAN><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>Alternative transistor architectures including PDSOI, FDSOI, DGSOI, FinFETs, MuGFETs, vertical MOSFET, IMOS and tunnel FET structures&#046; Benchmarking of new architectures w&#046;r&#046;t&#046; bulk CMOS&#046;<O:P></O:P></SPAN> <LI><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: Symbol&#8243;><SPAN><SPAN style=&#8243;FONT: 7pt &#8242;Times New Roman&#8242;; font&#8211;size&#8211;adjust: none; font&#8211;stretch: normal&#8243;></SPAN></SPAN></SPAN><SPAN lang=EN&#8211;GB style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>One dimensional and zero dimensional structures: nanowires, nanotubes, nanodots&#046; Nanowire and nanotube based interconnects; nanocrystal based NVM memory cells&#046;</SPAN><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;><O:P></O:P></SPAN> <LI><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: Symbol&#8243;><SPAN><SPAN style=&#8243;FONT: 7pt &#8242;Times New Roman&#8242;; font&#8211;size&#8211;adjust: none; font&#8211;stretch: normal&#8243;></SPAN></SPAN></SPAN><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>Variability and fluctuation phenomena in electronic switches and memory devices&#046; Single electron, few electron, discrete dopant and discrete charge effects in scaled electron devices&#046;<O:P></O:P></SPAN> <LI><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: Symbol&#8243;><SPAN><SPAN style=&#8243;FONT: 7pt &#8242;Times New Roman&#8242;; font&#8211;size&#8211;adjust: none; font&#8211;stretch: normal&#8243;></SPAN></SPAN></SPAN><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>Advanced physics based modeling and simulation of nanoscale switches and memory&#046; First principle and ab&#8211;initio modeling of devices, materials and interfaces for CMOS&#046; <O:P></O:P></SPAN> <LI><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: Symbol&#8243;><SPAN><SPAN style=&#8243;FONT: 7pt &#8242;Times New Roman&#8242;; font&#8211;size&#8211;adjust: none; font&#8211;stretch: normal&#8243;></SPAN></SPAN></SPAN><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>Quasi ballistic, ballistic and quantum transport in nanoscale devices&#046; Compact modeling of nanoscale devices&#046; Modeling and management of thermal effects&#046; Benchmarking of modeling approaches&#046;<O:P></O:P></SPAN> <LI><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: Symbol&#8243;><SPAN><SPAN style=&#8243;FONT: 7pt &#8242;Times New Roman&#8242;; font&#8211;size&#8211;adjust: none; font&#8211;stretch: normal&#8243;></SPAN></SPAN></SPAN><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>Process characterization through device parameter extraction, device and electrical characterization of nanometer scale technologies&#046;<O:P></O:P></SPAN> <LI><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: Symbol&#8243;><SPAN><SPAN style=&#8243;FONT: 7pt &#8242;Times New Roman&#8242;; font&#8211;size&#8211;adjust: none; font&#8211;stretch: normal&#8243;></SPAN></SPAN></SPAN><SPAN lang=EN&#8211;US style=&#8243;FONT&#8211;SIZE: 10pt; FONT&#8211;FAMILY: &#8242;Arial&#8242;,&#8242;sans&#8211;serif&#8242;&#8243;>CMOS compatible molecular and quantum devices; non conventional nanodevices for sensors, actuators and bioelectronics&#046; NanoCMOS to bio&#8211; and opto&#8211; interfaces&#046;<O:P></O:P></SPAN> </LI></UL>