<P class=MsoNormal style=″MARGIN: 0cm 0cm 0pt″><SPAN lang=DE style=″FONT–FAMILY: Arial; mso–bidi–font–family: ′Times New Roman′″>Das nationale Treffen am 11. April 2008, zu dem ich hiermit herzlich einladen möchte, wird mal wieder am Fraunhofer Institut für Siliziumtechnologie ISIT in Itzehoe durchgeführt. Es findet in der Zeit von 8:30 – ca. 16:00 im Institutsgebäude des ISIT in der Fraunhoferstr. 1 statt. Wie immer wird es am Vorabend die Möglichkeit für ausgiebige Gespräche im Rahmen eines gemeinsamen Dinner–Buffets geben.<?xml:namespace prefix = o ns = ″urn:schemas–microsoft–com:office:office″ /></SPAN></P> <B>Keywords:</B> <P class=MsoNormal style=″MARGIN: 0cm 0cm 0pt 18pt; TEXT–INDENT: –18pt; mso–list: l2 level1 lfo1; tab–stops: list 18.0pt″><SPAN lang=DE style=″FONT–FAMILY: Symbol; mso–fareast–font–family: Symbol; mso–bidi–font–family: Symbol″><SPAN style=″mso–list: Ignore″>·<SPAN style=″FONT: 7pt ′Times New Roman′″> </SPAN></SPAN></SPAN><SPAN lang=DE style=″FONT–FAMILY: Arial; mso–bidi–font–family: ′Times New Roman′″>CMP–Prozesse<SPAN style=″mso–tab–count: 1″> </SPAN>STI, Dielektrika, Metalle, poly–Si, post–CMP Reinigung</SPAN></P> <P class=MsoNormal style=″MARGIN: 0cm 0cm 0pt 18pt; TEXT–INDENT: –18pt; mso–list: l4 level1 lfo2; tab–stops: list 18.0pt″><SPAN lang=DE style=″FONT–FAMILY: Symbol; mso–fareast–font–family: Symbol; mso–bidi–font–family: Symbol″><SPAN style=″mso–list: Ignore″>·<SPAN style=″FONT: 7pt ′Times New Roman′″> </SPAN></SPAN></SPAN><SPAN lang=DE style=″FONT–FAMILY: Arial; mso–bidi–font–family: ′Times New Roman′″>CMP–Equipment<SPAN style=″mso–tab–count: 1″> </SPAN>Neue Toolentwicklungen, 300mm, ECMP, Cleaner</SPAN></P> <P class=MsoNormal style=″MARGIN: 0cm 0cm 0pt 18pt; TEXT–INDENT: –18pt; mso–list: l3 level1 lfo3; tab–stops: list 18.0pt″><SPAN lang=DE style=″FONT–FAMILY: Symbol; mso–fareast–font–family: Symbol; mso–bidi–font–family: Symbol″><SPAN style=″mso–list: Ignore″>·<SPAN style=″FONT: 7pt ′Times New Roman′″> </SPAN></SPAN></SPAN><SPAN lang=DE style=″FONT–FAMILY: Arial; mso–bidi–font–family: ′Times New Roman′″>CMP Meßtechnik<SPAN style=″mso–tab–count: 1″> </SPAN>Endpunkterkennung, Prozeßkontrolle (APC)</SPAN></P> <P class=MsoNormal style=″MARGIN: 0cm 0cm 0pt 18pt; TEXT–INDENT: –18pt; mso–list: l0 level1 lfo4; tab–stops: list 18.0pt″><SPAN lang=EN–GB style=″FONT–FAMILY: Symbol; mso–fareast–font–family: Symbol; mso–bidi–font–family: Symbol; mso–ansi–language: EN–GB″><SPAN style=″mso–list: Ignore″>·<SPAN style=″FONT: 7pt ′Times New Roman′″> </SPAN></SPAN></SPAN><SPAN lang=EN–GB style=″FONT–FAMILY: Arial; mso–bidi–font–family: ′Times New Roman′; mso–ansi–language: EN–GB″>CMP Materialien<SPAN style=″mso–tab–count: 1″> </SPAN>Pads, Slurries, Fixed Abrasive CMP, Abrasive–free </SPAN></P> <P class=MsoNormal style=″MARGIN: 0cm 0cm 0pt 86.45pt; TEXT–INDENT: 86.45pt″><SPAN lang=DE style=″FONT–FAMILY: Arial; mso–bidi–font–family: ′Times New Roman′″>Polishing, Filtration, Abwasserbehandlung, Recycling</SPAN></P> <P class=MsoNormal style=″MARGIN: 0cm 0cm 0pt 18pt; TEXT–INDENT: –18pt; mso–list: l1 level1 lfo5; tab–stops: list 18.0pt″><SPAN lang=DE style=″FONT–FAMILY: Symbol; mso–fareast–font–family: Symbol; mso–bidi–font–family: Symbol″><SPAN style=″mso–list: Ignore″>·<SPAN style=″FONT: 7pt ′Times New Roman′″> </SPAN></SPAN></SPAN><SPAN lang=DE style=″FONT–FAMILY: Arial; mso–bidi–font–family: ′Times New Roman′″>weitere CMP–Themen<SPAN style=″mso–tab–count: 1″> </SPAN>Modelling, Simulation, Trends, Konferenzen, weitere CMP–</SPAN></P> <P class=MsoNormal style=″MARGIN: 0cm 0cm 0pt 172.9pt″><SPAN lang=DE style=″FONT–FAMILY: Arial; mso–bidi–font–family: ′Times New Roman′″>Anwendungen (z.B. MEMS, 3D–Integration, Siliziumwafer und andere Substrate, Optik, Disks)</SPAN></P>
Abbrevation
20. CMP-Nutzertreffen
City
München
Country
Germany
Start Date
End Date
Abstract