SPIE Photomask Technology 28th Annual Symposium, Monterey, Vereinigte Staaten

<P> The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry&#046; This year&#8242;s four&#8211;day symposium will give you the chance to present your research on emerging and on&#8211;going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions&#046; With the deep sub&#8211;wavelength era upon us, the industry&#8242;s progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication&#046; </P> <P><B>Keywords:</B> </P> <P>Mask Infrastructure</P> <UL> <LI>Materials <LI>Patterning <LI>Resist Processing <LI>Etch <LI>Inspection <LI>Cleaning <LI>Repair <LI>Metrology</LI></UL> <P><BR>Mask Integration<BR></P> <UL> <LI>Double patterning <LI>Design for Manufacturing/Process Integration and yield optimization <LI>Source/mask optimization <LI>Simulation and Tolerancing for Hyper&#8211;NA Applications <LI>Substrates and Materials <LI>Extreme NA/Immersion Applications <LI>Reticle Enhancement and Optical Proximity Effects <LI>Mask Data Preparation and Mask Rules Development <LI>Advanced RET <LI>DFM Opportunities for Fabless Applications<BR></LI></UL> <P>Emerging Mask Technology</P> <UL> <LI>Double patterning <LI>EUV Mask Materials <LI>EUV Mask Infrastructure <LI>Imprint <LI>Gray Scale Technology<BR></LI></UL> <P>Mask Business</P> <UL> <LI>Mask Business and Management <LI>Direct Write/Maskless Technology</LI></UL>