<P>The Industrial Technology Research Institute (ITRI) will sponsor the 16th International Symposium on VLSI Technology, Systems and Applications (2009 VLSI–TSA) from 27 to 29 April 2009 at the Ambassador Hotel in Hsinchu, Taiwan. The symposium program will cover 2.5 days technical sessions including 3 plenary talks, two special sessions focusing on Green Devices and Next Generation Lithography, and numbers of contribution sessions followed by a half–day short course. The Best Student Paper Award for the 2008 Symposium will be presented at the opening of the symposium and the Best Student Paper Award for the 2009 Symposium will again be selected during the conference.</P> <P><B>Keywords:</B> <TABLE cellSpacing=0 cellPadding=0 width=″95%″ align=center border=0> <TBODY> <TR class=font–SLATEGRAY–11> <TD width=″50%″> <UL> <LI>CMOS, SiGe bipolar, and BiCMOS ICs <LI>DRAM, SRAM and non–volatile memory <LI>Merged logic and memory <LI>SOI material and devices <LI>Device and interconnect reliability <LI>Process and device modeling <LI>Advanced lithography technologies <LI>TFT technology <LI>Advanced packaging technology </LI></UL></TD> <TD> <UL> <LI>Advanced process technology <LI>Interconnect technology <LI>High–k and low–k materials <LI>Emerging transistor structures <LI>Nanoelectronic devices/technology <LI>Organic electronics and photonics <LI>Novel device concept <LI>Yield enhancement <LI>Process control </LI></UL></TD></TR></TBODY></TABLE></P>
Abbrevation
VLSI-TSA
City
Hsinchu
Country
Taiwan
Deadline Paper
Start Date
End Date
Abstract