The IEEE ICSICT–2012 conference is the 11th in the series aiming to provide an international forum for the presentation and discussion of recent advances in solid–state and integrated circuit technology. The conference will be held on Oct.29–Nov.1, 2012 in Xi’an, China. All aspects of solid–state devices, circuits, processing technologies, materials and other related research are within the scope of the conference. The three days of contributed and invited presentations on the latest developments in diverse fields given in oral and poster sessions, panel discussions on leading edge technology issues, and other activities will provide extensive opportunities for technical information exchange as well as a stimulating environment for mutual communication among participants. An exhibition of equipment and materials for solid state and integrated circuit technologies will be held concurrently with the conference. In addition, there will be discussions devoted to opportunities for cooperation and joint ventures in the microelectronics business in China. Excellent Student Paper Award will be presented at the closing of the conference.<br>The Scope and Topics of the Conference<br>Process & Device Technologies<br>1. Channel Engineering<br>2. High–k/Metal gate Technology<br>3. Advanced Source/Drain Technology<br>4. Interconnect Technology<br>5. Advanced 3D Integration<br>6. Novel Process Technologies<br>7. Ultra–Thin Body Transistors and Device Variability<br>8. Advanced High–k Metal Gate SoC and High Performance CMOS Platforms<br>9. CMOS Performance Enhancing and Novel Devices<br>10. Advanced FinFETs and Nanowire FETs<br>11. CNT, MTJ Devices and Nanowire Photodiodes<br>12. Low– Power and Steep Slope Switching Devices<br>13. Graphene Devices<br>14. Advanced Technologies for Ge MOSFETs<br>15. Organic semiconductor devices and technologies<br>16. Compound semiconductor devices and Technology<br>17. Ultra High Speed Transistors, HEMT/HBT etc.<br>18. Advanced Power Devices and Reliability<br>19. Flash Memory<br>20. IT Magnetic RAM<br>21. Resistive RAMs<br>22. Phase Change Memory<br>23. 3–Dimensional Memory<br>24. MEMS Technology<br>25. Thin Film Transistors<br>26. Biosensors<br>27. PV and Energy Harvesting<br>28. Front End of Line (FEOL) Reliability<br>29. Memory Reliability<br>30. Back–End of Line and ESD Reliability<br>31. High–Frequency and Multi–Gate Device & Modeling<br>32. Advanced Device Performance and Variation Modeling<br>33. Simulation of Memory Devices<br>34. Simulation of Non–Silicon Materials and Devices<br>Circuits & ICCAD<br>35. Processors<br>36. Analog Circuits<br>37. SOC<br>38. PLL and CDR<br>39. Low–Power Nyquist ADCs<br>40. Digital Circuits Resilient<br>41. High–Resolution and High Speed Data Converters<br>42. Digital Chip–to–Chip and On–Die Interfaces<br>43. Advanced Clock Generation<br>44. Clocking Building Blocks<br>45. High Speed On–Die Network Processor Clocking<br>46. Advanced SRAM & DRAM Circuits, Embbeded Memorres<br>47. Nonvolatile Memories Circuits<br>48. Advanced Transceivers Techniques<br>49. RF and New Wireless Transceivers<br>50. RF Circuits and Systems<br>51. Interference Robust RF Receivers<br>52. Signal Processing for Wireless<br>53. System–Level Modeling & Simulation/Verification<br>54. System–Level Synthesis & Optimization<br>55. High–Level/Behavioral/Logic Synthesis & Optimization<br>56. Physical Design<br>57. DFM<br>
Abbrevation
ICSICT
City
Xian
Country
China
Deadline Paper
Start Date
End Date
Abstract