29th European Mask and Lithography Conference, Dresden, Deutschland

Conference Topics<br>Presentations are solicited for the following and related topics:<br>Mask Manufacturing<br>– Mask Data Preparation<br>– Pattern Generation: Writing, Etch, etc&#046;<br>– Photomask Processes &amp; Materials<br>– Metrology Tools &amp; Technologies<br>– Defect Inspection &amp; Repair<br>– Cleaning &amp; Haze<br>– Pellicles &amp; Mask Boxes<br>– Mask Process Yield &amp; Cycle Time<br>– Photomasks for RET &amp; OPC; PSM<br>– Masks for NGL: E&#8211;Beam, EUV, NIL, etc&#046;<br>Mask Business<br>– Mask Business and Management<br>– Mask Cost and Mask Development Strategy<br>– Future Mask Demand<br>Lithography and Mask Application<br>– Double Patterning<br>– RET, OPC, PSM, MEEF<br>– Resist<br>– Mask Defect Printability<br>– Optical Materials<br>– Immersion Lithography<br>– Immersion Defectivity<br>– Alternate Immersion Fluids<br>– Lithography Process Control<br>– Lithography Simulation<br>Emerging Mask and Lithography Technologies<br>– EUV Materials, Tools &amp; Processes<br>– EUV Mask Infastructure<br>– NIL<br>– Direct Write / Maskless Technologies<br>Mask and Lithography Equipment<br>– Mask Manufacturing<br>Semiconductors applied in Automotive<br>Semiconductors in MEMS Applications<br>Patterned Media<br>