3–D ICs enable dramatically improved performances at a much lower cost compared to new leading–edge CMOS technologies below 32 nm transistor fabrication. The success of these new ICs highly depends on the availability of new methodologies and skills that are required to achieve acceptable design quality and productivity. This workshop brings together key actors from semiconductor companies, system design houses and EDA industry to build a vision of the next step in 3D integrated ICs design. Topics that will be addressed include: Applications requiring 3D, interconnect architectures and thermal management for 3D ICs, application partitioning, floorplanning for 3D architectures, modeling, characterization and testing of 3D ICs.<br>
Abbrevation
D43D
City
Lausanne
Country
Switzerland
Start Date
End Date
Abstract