Conference Topics<br>Presentations are solicited for the following and related topics:<br>Mask Manufacturing and Mask Business<br>– Mask Data Preparation<br>– Pattern Generation: Writing, Etch, etc.<br>– Photomask Processes & Materials<br>– Metrology Tools & Technologies<br>– Defect Inspection & Repair<br>– Cleaning & Haze<br>– Pellicles & Mask Boxes<br>– Mask Process Yield & Cycle Time<br>– Photomasks for RET & OPC; PSM<br>– Mask Business and Management<br>– Mask Cost and Mask Development Strategy<br>– Future Mask Demand<br>Lithography Systems and Processes<br>– Optical resolution enhancements including OPC, Freeform Illumination,<br>Source–Mask–optimization (SMO) and Inverse Lithography Technology (ILT)<br>– Material–and–Process driven Resolution Enhancements including Multiple Patterning<br>and Chemical Shrinking<br>– Immersion Lithography including Defectivity<br>– Lithography Process Control<br>– Lithography and Etch Simulation including rigorous physical/ chemical Models and<br>Compact Models<br>Emerging Mask and Lithography Technologies<br>– EUV Lithography including Masks, Materials Processes and Infrastructure<br>– Directed Self–Assembly (DSA) including high chi Materials, Defectivity control and new<br>Processes<br>– Direct Write/ Maskless Technologies including Multi–Beam Technologies<br>– Nano–Imprint Lithography (NIL), Soft Lithography and Microprinting<br>Emerging Applications<br>– Non–IC Applications including Si–Photonics, flat Panel Displays and MEMS<br>– Lithographic Systems for non–IC Applications, including Laser Direct Write,<br>Interference Lithography and Mask Aligners<br>
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EMLC
City
Grenoble
Country
France
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